KUCCPS Updates Portal With New Degree Cut-Off Points Ahead of 2026 Application Cycle

The Kenya Universities and Colleges Central Placement Service (KUCCPS) has updated its online portal with new degree cut-off points and revised subject requirements ahead of the 2026 university application cycle. This move is aimed at guiding students who sat for the 2025 KCSE examinations as they prepare to select their preferred degree programmes.

A review of the portal shows that KUCCPS has already uploaded all available degree programmes, including their respective cut-off points, institution details, and programme codes. These updates come just before the official opening of the application window.

The placement body has organised courses into 20 clusters, each varying in competitiveness depending on demand, available slots, and institutional capacity. Notably, Social Sciences, Media, and Arts (Cluster 3) offer the widest range of programme options, while specialised fields such as Law (Cluster 1) have fewer choices.

Competitive clusters like Engineering, Business-related courses, and Agriculture and Environmental Sciences also provide a wide selection of programmes, with some offering up to 20 different course options.

Cut-off points differ across universities, meaning the same course may have varying entry requirements depending on the institution. For instance, Moi University currently records some of the lowest cut-off points among public universities for programmes such as Bachelor of Medicine and Surgery and Law.

Students can access the full list of updated programmes, including minimum requirements and cut-off points, through the KUCCPS portal. To log in, applicants need their KCSE index number, KCSE year, and KCPE index number as the password. Once logged in, they can navigate to the “All Programmes” section and filter courses based on their preferences.

With the application window expected to open soon, candidates are advised to carefully review programme requirements before submitting their choices to avoid placement challenges.